59 Patents
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- US125819272026Contact Over Active Gate Structures with Conductive Trench Contact Taps for Advanced Integrated Circuit Structure Fabrication
Intel Corporation
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- US125637792026Gate-all-around Integrated Structures Having Gate Height Reduction and Dielectric Capping Material with Shoulder Portions Inside Gate Stack
Intel Corporation
0 cites - US125576252026Spacer Self-aligned via Structures Using Directed Self Assembly for Gate Contact or Trench Contact
Intel Corporation
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- US125325382026Integrated Circuit Structures Having Conductive Structures in Fin Isolation Regions
Intel Corporation
0 cites - US125074642025Gate Aligned Fin Cut for Advanced Integrated Circuit Structure Fabrication
Intel Corporation
0 cites - US125016842025Integrated Circuit Structures with Backside Self-aligned Penetrating Conductive Source or Drain Contact
Intel Corporation
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- US124842472025Gate-all-around Integrated Circuit Structures Having Backside Contact with Enhanced Area Relative to Epitaxial Source
Intel Corporation
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- US124713492025Contact Over Active Gate Structures with Uniform and Conformal Gate Insulating Cap Layers for Advanced Integrated Circuit Structure Fabrication
Intel Corporation
0 cites - US124697802025Integrated Circuit Structure with Recessed Self-aligned Deep Boundary Via
Intel Corporation
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- US124648152025Fin Cut in Neighboring Gate and Source or Drain Regions for Advanced Integrated Circuit Structure Fabrication
Intel Corporation
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- US124577712025Plug and Recess Process for Dual Metal Gate on Stacked Nanoribbon Devices
Intel Corporation
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- US124084222025Integrated Circuit Structures with Backside Gate Cut or Trench Contact Cut
Intel Corporation
0 cites - US124009132025Contact Over Active Gate Structures with Conductive Trench Contact Taps for Advanced Integrated Circuit Structure Fabrication
Intel Corporation
0 cites - US123827062025Self-aligned Gate Endcap (SAGE) Architectures with Gate-all-around Devices
Intel Corporation
0 cites - US123827212025Integrated Circuit Structures Having Cut Metal Gates with Dielectric Spacer Fill
Intel Corporation
0 cites - US123693922025Fabrication of Gate-all-around Integrated Circuit Structures Having Pre-spacer Deposition Cut Gates
Intel Corporation
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- US123640012025Integrated Circuit Structures with Backside Gate Partial Cut or Trench Contact Partial Cut
Intel Corporation
0 cites - US123426122025Neighboring Gate-all-around Integrated Circuit Structures Having Disjoined Epitaxial Source or Drain Regions
Intel Corporation
0 cites - US122726882025Selective Growth Self-aligned Gate Endcap (SAGE) Architectures Without Fin End Gap
Intel Corporation
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- US122495412025Vertical Edge Blocking (VEB) Technique for Increasing Patterning Process Margin
Intel Corporation
0 cites - US122243502025Self-aligned Gate Endcap (SAGE) Architectures with Gate-all-around Devices
Intel Corporation
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- US121319892024Vertical Metal Splitting Using Helmets and Wrap-around Dielectric Spacers
Intel Corporation
0 cites - US120806392024Contact Over Active Gate Structures with Metal Oxide Layers to Inhibit Shorting
Intel Corporation
0 cites - US120683142024Fabrication of Gate-all-around Integrated Circuit Structures Having Adjacent Island Structures
Intel Corporation
0 cites - US120574912024Self-aligned Gate Endcap (SAGE) Architectures with Gate-all-around Devices Above Insulator Substrates
Intel Corporation
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- US120466522024Plug and Recess Process for Dual Metal Gate on Stacked Nanoribbon Devices
Intel Corporation
0 cites - US120149592024Integrated Nanowire and Nanoribbon Patterning in Transistor Manufacture
Intel Corporation
0 cites - US119904722024Fabrication of Gate-all-around Integrated Circuit Structures Having Pre-spacer Deposition Cut Gates
Intel Corporation
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- US118626352024Neighboring Gate-all-around Integrated Circuit Structures Having Disjoined Epitaxial Source or Drain Regions
Intel Corporation
0 cites - US118552232023Self-aligned Gate Endcap (SAGE) Architectures with Gate-all-around Devices
Intel Corporation
0 cites - US117497332023FIN Shaping Using Templates and Integrated Circuit Structures Resulting Therefrom
Intel Corporation
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- US117157752023Self-aligned Gate Endcap (SAGE) Architectures with Gate-all-around Devices Having Epitaxial Source or Drain Structures
Intel Corporation
0 cites - US115944482023Vertical Edge Blocking (VEB) Technique for Increasing Patterning Process Margin
Intel Corporation
0 cites - US115946372023Gate-all-around Integrated Circuit Structures Having Fin Stack Isolation
Intel Corporation
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