Patents/Inventors

Kyoung-sub Shin

Seongnam-siKR1 patent

2 Patents

US122610872025
Methods of Manufacturing Semiconductor Devices by Etching Active Fins Using Etching Masks and Forming Source/drain Layers on the Active Fins
SAMSUNG ELECTRONICS CO., Ltd.
0 cites
US118307752023
Methods of Manufacturing Semiconductor Devices by Etching Active Fins Using Etching Masks
SAMSUNG ELECTRONICS CO., Ltd.
0 cites