Patents/Inventors

Kwangduk Douglas Lee

Redwood City, CAUS16 patents

17 Patents

US122345492025
Method of in Situ Ceramic Coating Deposition
Applied Materials, Inc.
0 cites
US122116732025
Processing Chamber Deposition Confinement
Applied Materials, Inc.
0 cites
US122116942025
Ultra-high Modulus and Etch Selectivity Boron-carbon Hardmask Films
APPLIED MATERIALS, Inc.
0 cites
US121911152025
Dual RF for Controllable Film Deposition
Applied Materials, Inc.
0 cites
US121365492024
Plasma-enhanced Chemical Vapor Deposition of Carbon Hard-mask
APPLIED MATERIALS, Inc.
0 cites
US121319132024
Methods, Systems, and Apparatus for Processing Substrates Using One or More Amorphous Carbon Hardmask Layers
Applied Materials, Inc.
0 cites
US121129492024
Highly Etch Selective Amorphous Carbon Film
Applied Materials, Inc.
0 cites
US121006092024
Electrostatic Chucking Process
Applied Materials, Inc.
0 cites
US120402102024
Multi-pressure Bipolar Electrostatic Chucking
Applied Materials, Inc.
0 cites
US120149272024
Highly Etch Selective Amorphous Carbon Film
Applied Materials, Inc.
0 cites
US120000482024
Pedestal for Substrate Processing Chambers
Applied Materials, Inc.
0 cites
US117281682023
Ultra-high Modulus and Etch Selectivity Boron-carbon Hardmask Films
APPLIED MATERIALS, Inc.
0 cites
US116995772023
Treatment for High-temperature Cleans
Applied Materials, Inc.
0 cites
US116949022023
Methods, Systems, and Apparatus for Processing Substrates Using One or More Amorphous Carbon Hardmask Layers
Applied Materials, Inc.
0 cites
US116742222023
Method of in Situ Ceramic Coating Deposition
Applied Materials, Inc.
0 cites
US115849942023
Pedestal for Substrate Processing Chambers
Applied Materials, Inc.
0 cites
US115606232023
Methods of Reducing Chamber Residues
Applied Materials, Inc.
0 cites