4 Patents
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- US124943522025Plasma Confinement Ring, Semiconductor Manufacturing Apparatus Including the Same, and Method of Manufacturing a Semiconductor Device Using the Same
SAMSUNG ELECTRONICS CO., Ltd.
0 cites - US122223622025Method of Measuring Parameters of Plasma, Apparatus for Measuring Parameters of Plasma, Plasma Processing System, and Method of Processing Wafer
SAMSUNG ELECTRONICS CO., Ltd.
0 cites - US121835552024Substrate Processing Apparatus and Method of Manufacturing Semiconductor Device Using the Same
SAMSUNG ELECTRONICS CO., Ltd.
0 cites