Patents/Inventors

Koichi Nagami

MiyagiJP24 patents

18 Patents

US126032582026
Plasma Processing Apparatus and Plasma Processing Method
TOKYO ELECTRON LIMITED
0 cites
US125371682026
Plasma Processing Method and Plasma Processing Apparatus
TOKYO ELECTRON LIMITED
0 cites
US125371722026
Plasma Processing Method and Plasma Processing Apparatus
TOKYO ELECTRON LIMITED
0 cites
US124379702025
Plasma Processing Method and Plasma Processing Apparatus
Tokyo Electron Limited
0 cites
US124008322025
Plasma Processing Apparatus and Plasma Processing Method
Tokyo Electron Limited
0 cites
US122610272025
Plasma Processing Apparatus and Plasma Processing Method
TOKYO ELECTRON LIMITED
0 cites
US122550492025
Plasma Processing Apparatus and Plasma Processing Method
TOKYO ELECTRON LIMITED
0 cites
US122437232025
Plasma Processing Apparatus
Tokyo Electron Limited
0 cites
US121547932024
Etching Apparatus and Etching Method
TOKYO ELECTRON LIMITED
0 cites
US121365352024
Plasma Processing Apparatus and Plasma Processing Method
TOKYO ELECTRON LIMITED
0 cites
US120338322024
Plasma Processing Method and Plasma Processing Apparatus
TOKYO ELECTRON LIMITED
0 cites
US120338332024
Filter Circuit and Plasma Processing Apparatus
TOKYO ELECTRON LIMITED
0 cites
US118878172024
Plasma Processing Apparatus and Plasma Processing Method
Tokyo Electron Limited
0 cites
US117767952023
Plasma Processing Apparatus and Power Supply Control Method
TOKYO ELECTRON LIMITED
0 cites
US117640342023
Plasma Processing Method and Plasma Processing Apparatus
Tokyo Electron Limited
0 cites
US117640822023
Control Method and Plasma Processing Apparatus
TOKYO ELECTRON LIMITED
0 cites
US116461812023
Plasma Processing Apparatus and Plasma Processing Method
TOKYO ELECTRON LIMITED
0 cites
US115943982023
Apparatus and Method for Plasma Processing
TOKYO ELECTRON LIMITED
0 cites