Patents/Inventors

Kimiyuki Kanno

TokyoJP2 patents

2 Patents

US125299582026
Photosensitive Resin Composition, Method for Producing Resin Film Having Pattern, Resin Film Having Pattern, and Semiconductor Circuit Substrate
JSR CORPORATION
0 cites
US122822532025
Photosensitive Resin Composition
JSR CORPORATION
0 cites