25 Patents
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- US124890562025Semiconductor Device Having an Upper End of a Lower Spacer Structure on a Level Same as or Lower Than a Lower End of a Storage Node Contact
Samsung Electronics Co., Ltd.
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- US124190492025Semiconductor Memory Device Including Symmetrical Channel Patterns and Wordlines
SAMSUNG ELECTRONICS CO., Ltd.
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- US123025512025Semiconductor Memory Device and Method of Fabricating the Same
SAMSUNG ELECTRONICS CO., Ltd.
0 cites - US122794152025Method of Fabricating Semiconductor Memory Device Having Protruding Contact Portion
Samsung Electronics Co., Ltd.
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- US119293242024Semiconductor Devices Having Improved Electrical Characteristics and Methods of Fabricating the Same
Samsung Electronics Co., Ltd.
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- US117281672023Method of Forming Patterns, Integrated Circuit Device, and Method of Manufacturing the Integrated Circuit Device
SAMSUNG ELECTRONICS CO., Ltd.
0 cites - US117231912023Semiconductor Memory Devices Having Protruding Contact Portions
Samsung Electronics Co., Ltd.
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- US116886872023Semiconductor Devices Having Landing Pad Patterns and Methods of Manufacturing the Same
Samsung Electronics Co., Ltd.
0 cites - US116581172023Semiconductor Devices Having Improved Electrical Characteristics and Methods of Fabricating the Same
Samsung Electronics Co., Ltd.
0 cites - US116462252023Semiconductor Devices and Methods of Fabricating the Same
SAMSUNG ELECTRONICS CO., Ltd.
0 cites - US116160662023Semiconductor Device and Manufacturing Method of the Same
SAMSUNG ELECTRONICS CO., Ltd.
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