Kenneth S. Collins

7 Patents

• US125557482026

  Symmetric Plasma Process Chamber

  Applied Materials, Inc.

  0 cites
• US124379732025

  Plasma Chamber with Multiphase Rotating Independent Gas Cross-flow with Reduced Volume and Dual VHF

  Applied Materials, Inc.

  0 cites
• US123343832025

  Substrate Support Gap Pumping to Prevent Glow Discharge and Light-up

  APPLIED MATERIALS, Inc.

  0 cites
• US121632182024

  Continuous Liner for Use in a Processing Chamber

  Applied Materials, Inc.

  0 cites
• US119357242024

  Symmetric VHF Source for a Plasma Reactor

  Applied Materials, Inc.

  0 cites
• US118147242023

  Continuous Liner for Use in a Processing Chamber

  APPLIED MATERIALS, Inc.

  0 cites
• US115877662023

  Symmetric VHF Source for a Plasma Reactor

  Applied Materials, Inc.

  0 cites