10 Patents
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- US124760942025Model-based Characterization of Plasmas in Semiconductor Processing Systems
Applied Materials, Inc.
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- US119011612024Methods and Apparatus for Symmetrical Hollow Cathode Electrode and Discharge Mode for Remote Plasma Processes
APPLIED MATERIALS, Inc.
0 cites - US118942172024Plasma Ignition Optimization in Semiconductor Processing Chambers
Applied Materials, Inc.
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- US115877652023Plasma Ignition Optimization in Semiconductor Processing Chambers
Applied Materials, Inc.
0 cites - 0 cites
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