Patents/Inventors

Ken Maruyama

TokyoJP6 patents

7 Patents

US124227482025
Radiation-sensitive Resin Composition and Method for Forming Resist Pattern
JSR CORPORATION
0 cites
US120929572024
Radiation-sensitive Resin Composition, Method for Forming Resist Pattern and Compound
JSR CORPORATION
0 cites
US119661612024
Radiation-sensitive Resin Composition, Method of Forming Resist Pattern, and Compound
JSR CORPORATION
0 cites
US117452162023
Method for Producing Film
JSR CORPORATION
0 cites
US117477252023
Radiation-sensitive Resin Composition and Method for Forming Resist Pattern
JSR CORPORATION
0 cites
US116094952023
Radiation-sensitive Resin Composition and Resist Pattern-forming Method
JSR CORPORATION
0 cites
US115927462023
Radiation-sensitive Resin Composition, Resist Pattern-forming Method, Compound and Method of Generating Acid
JSR CORPORATION
0 cites