7 Patents
- US124313612025Self-aligned Double Patterning with Spatial Atomic Layer Deposition
Applied Materials, Inc.
0 cites - US120787632024Radiation Analysis System, Charged Particle Beam System, and Radiation Analysis Method
Hitachi High-tech Corporation
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- US116933192023Substrate Processing Method, Substrate Processing Apparatus, and Storage Medium
TOKYO ELECTRON LIMITED
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