5 Patents
- US124297722025Chemically Amplified Resist Composition, Photomask Blank, Method for Forming Resist Pattern, and Method for Producing Polymer Compound
SHIN-ETSU CHEMICAL CO., Ltd.
0 cites - US121642272024Chemically Amplified Negative Resist Composition and Resist Pattern Forming Process
SHIN-ETSU CHEMICAL CO., Ltd.
0 cites - US121642312024Chemically Amplified Positive Resist Composition and Resist Pattern Forming Process
SHIN-ETSU CHEMICAL CO., Ltd.
0 cites - US118529742023Conductive Polymer Composition, Coated Product and Patterning Process
SHIN-ETSU CHEMICAL CO., Ltd.
0 cites - US115488442023Monomer, Polymer, Negative Resist Composition, Photomask Blank, and Resist Pattern Forming Process
SHIN-ETSU CHEMICAL CO., Ltd.
0 cites