8 Patents
- US125059762025Charged Particle Beam Apparatus and Method for Calculating Roughness Index
HITACHI HIGH-TECH CORPORATION
0 cites - US124630052025Correction Coefficient Calculation Device, Correction Coefficient Calculation Method, and Correction Coefficient Calculation Program
Hitachi High-tech Corporation
0 cites - US123548292025Overlay Measurement System and Overlay Measurement Device for Overlay Error Measurement Using Electron Microscopy
Hitachi High-tech Corporation
0 cites - US123470742025Pattern Measurement System, Pattern Measurement Method, and Program for Measuring Edge Roughness at the Edge of a Pattern Based on a Random Noise Component
Hitachi High-tech Corporation
0 cites - US121983272025Measurement System, Method for Generating Learning Model to Be Used When Performing Image Measurement of Semiconductor Including Predetermined Structure, and Recording Medium for Storing Program for Causing Computer to Execute Processing for Generating Learning Model to Be Used When Performing Image Measurement of Semiconductor Including Predetermined Structure
Hitachi High-tech Corporation
0 cites - US117911302023Electron Beam Observation Device, Electron Beam Observation System, and Image Correcting Method and Method for Calculating Correction Factor for Image Correction in Electron Beam Observation Device
Hitachi High-tech Corporation
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