15 Patents
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- US122769212025Substrate Comprising a Target Arrangement, and Associated at Least One Patterning Device, Lithographic Method and Metrology Method
ASML Netherlands B.V.
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- US121893142025Metrology Method and Associated Metrology and Lithographic Apparatuses
ASML NETHERLANDS B.V.
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- US120614212024Method and System for Determining Information About a Target Structure
ASML Netherlands B.V.
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- US120322992024Metrology Method and Associated Metrology and Lithographic Apparatuses
ASML NETHERLANDS B.V.
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