Katsuhide Watanabe

9 Patents

• US125699562026

  Control Method for Processing of a Substrate

  Kioxia Corporation

  0 cites
• US121793102024

  Output Signal Processing Apparatus for Eddy Current Sensor

  EBARA CORPORATION

  0 cites
• US120768342024

  Eddy Current Sensor

  EBARA CORPORATION

  0 cites
• US120625632024

  Substrate Processing Apparatus, Substrate Processing System, and Substrate Processing Method

  EBARA CORPORATION

  0 cites
• US120366342024

  Substrate Processing Control System, Substrate Processing Control Method, and Program

  EBARA CORPORATION

  0 cites
• US120173232024

  Polishing Head System and Polishing Apparatus

  EBARA CORPORATION

  0 cites
• US118336362023

  Substrate Polishing Apparatus, Method of Creating Thickness Map, and Method of Polishing a Substrate

  EBARA CORPORATION

  0 cites
• US117599122023

  Magnetic Element and Eddy Current Sensor Using the Same

  EBARA CORPORATION

  0 cites
• US116732222023

  Polishing Head System and Polishing Apparatus

  EBARA CORPORATION

  0 cites