Patents/Inventors

Kartik Ramaswamy

San Jose, CAUS66 patents

59 Patents

US126205532026
Remote Surface Wave Propagation for Semiconductor Chambers
Applied Materials Inc.
0 cites
US125867612026
Fast Tuning Radio Frequency (RF) Matching Network
Applied Materials, Inc.
0 cites
US125801552026
Learning Based Tuning in a Radio Frequency Plasma Processing Chamber
Applied Materials, Inc.
0 cites
US125735882026
Plasma Processing System Configured to Deliver a Pulsed Voltage Waveform
Applied Materials, Inc.
0 cites
US125675612026
High-power Density RF Remote Plasma Source Apparatus
Applied Materials, Inc.
0 cites
US125675392026
Methods for Forming a High Current Inductor and Non-transitory Computer Readable Medium
APPLIED MATERIALS, Inc.
0 cites
US125623532026
Replaceable Electrostatic Chuck Outer Ring for Edge Arcing Mitigation
Applied Materials, Inc.
0 cites
US125557482026
Symmetric Plasma Process Chamber
Applied Materials, Inc.
0 cites
US125059822025
Method and Apparatus for Digital Control of Ion Energy Distribution in a Plasma
Applied Materials, Inc.
0 cites
US124865772025
Pulsed Plasma (DC/RF) Deposition of High Quality C Films for Patterning
Applied Materials, Inc.
0 cites
US124826522025
Method for Forming Integrated Circuit Structures
Applied Materials Inc.
0 cites
US124760812025
Methods and Apparatus for Processing a Substrate
Applied Materials Inc.
0 cites
US124697332025
Wafer to Baseplate Arc Prevention Using Textured Dielectric
APPLIED MATERIALS, Inc.
0 cites
US124696802025
Radio-frequency (RF) Matching Network for Fast Impedance Tuning
Applied Materials, Inc.
0 cites
US124630112025
Inductively Coupled Plasma Source with Radial Coil Network
Applied Materials Inc.
0 cites
US124566072025
Auxiliary Plasma Source for Robust Ignition and Restrikes in a Plasma Chamber
Applied Materials, Inc.
0 cites
US124008452025
Ion Energy Control on Electrodes in a Plasma Reactor
Applied Materials, Inc.
0 cites
US123680202025
Pulsed Voltage Source for Plasma Processing Applications
Applied Materials, Inc.
0 cites
US123476472025
Plasma Excitation with Ion Energy Control
Applied Materials, Inc.
0 cites
US123343832025
Substrate Support Gap Pumping to Prevent Glow Discharge and Light-up
APPLIED MATERIALS, Inc.
0 cites
US123343042025
System and Methods for Implementing a Micro Pulsing Scheme Using Dual Independent Pulsers
Applied Materials, Inc.
0 cites
US122938972025
Radio Frequency Diverter Assembly Enabling On-demand Different Spatial
Applied Materials, Inc.
0 cites
US122780892025
Plasma Uniformity Control System and Methods
Applied Materials, Inc.
0 cites
US122725242025
Wideband Variable Impedance Load for High Volume Manufacturing Qualification and On-site Diagnostics
Applied Materials, Inc.
0 cites
US122665062025
Scanning Impedance Measurement in a Radio Frequency Plasma Processing Chamber
Applied Materials, Inc.
0 cites
US122610192025
Voltage Pulse Time-domain Multiplexing
Applied Materials, Inc.
0 cites
US122371482025
Plasma Processing Assembly Using Pulsed-voltage and Radio-frequency Power
Applied Materials, Inc.
0 cites
US122241922025
Bowed Substrate Clamping Method, Apparatus, and System
APPLIED MATERIALS, Inc.
0 cites
US122057972025
Solid-state Switch Based High-speed Pulser with Plasma IEDF Modification Capability Through Multilevel Output Functionality
Applied Materials, Inc.
0 cites
US121836052024
In-situ Semiconductor Processing Chamber Temperature Apparatus
Applied Materials, Inc.
0 cites
US121632182024
Continuous Liner for Use in a Processing Chamber
Applied Materials, Inc.
0 cites
US121365372024
Cost Effective Radio Frequency Impedance Matching Networks
Applied Materials, Inc.
0 cites
US121305612024
Gas Distribution Plate with UV Blocker
APPLIED MATERIALS, Inc.
0 cites
US121256892024
Methods and Apparatus for Toroidal Plasma Generation
APPLIED MATERIALS, Inc.
0 cites
US121113412024
In-situ Electric Field Detection Method and Apparatus
Applied Materials, Inc.
0 cites
US121069382024
Distortion Current Mitigation in a Radio Frequency Plasma Processing Chamber
APPLIED MATERIALS, Inc.
0 cites
US120947162024
Chambers and Coatings for Reducing Backside Damage
Applied Materials, Inc.
0 cites
US120805192024
Smart Dynamic Load Simulator for RF Power Delivery Control System
Applied Materials, Inc.
0 cites
US120464492024
Methods and Apparatus for Processing a Substrate
APPLIED MATERIALS, Inc.
0 cites
US120209012024
RF Impedance Matching Networks for Substrate Processing Platform
APPLIED MATERIALS, Inc.
0 cites
US119729242024
Pulsed Voltage Source for Plasma Processing Applications
Applied Materials, Inc.
0 cites
US119674832024
Plasma Excitation with Ion Energy Control
Applied Materials, Inc.
0 cites
US119488262024
High Power Electrostatic Chuck Design with Radio Frequency Coupling
Applied Materials, Inc.
0 cites
US119357242024
Symmetric VHF Source for a Plasma Reactor
Applied Materials, Inc.
0 cites
US119158502024
Two Channel Cosine-theta Coil Assembly
APPLIED MATERIALS, Inc.
0 cites
US118942552024
Sheath and Temperature Control of Process Kit
APPLIED MATERIALS, Inc.
0 cites
US118481762023
Plasma Processing Using Pulsed-voltage and Radio-frequency Power
Applied Materials, Inc.
0 cites
US118238682023
Hardware Switch on Main Feed Line in a Radio Frequency Plasma Processing Chamber
Applied Materials, Inc.
0 cites
US118147242023
Continuous Liner for Use in a Processing Chamber
APPLIED MATERIALS, Inc.
0 cites
US118107602023
Apparatus and Method of Ion Current Compensation
Applied Materials, Inc.
0 cites
US117840422023
Carbon Hard Masks for Patterning Applications and Methods Related Thereto
APPLIED MATERIALS, Inc.
0 cites
US117767892023
Plasma Processing Assembly Using Pulsed-voltage and Radio-frequency Power
Applied Materials, Inc.
0 cites
US117767882023
Pulsed Voltage Boost for Substrate Processing
Applied Materials, Inc.
0 cites
US117495052023
Methods and Apparatus for Processing a Substrate
APPLIED MATERIALS, Inc.
0 cites
US117354862023
Process Monitor Device Having a Plurality of Sensors Arranged in Concentric Circles
Applied Materials, Inc.
0 cites
US117215252023
Sensorless RF Impedance Matching Network
APPLIED MATERIALS, Inc.
0 cites
US116519662023
Methods and Apparatus for Processing a Substrate
APPLIED MATERIALS, Inc.
0 cites
US116035912023
Pulsed Plasma (DC/RF) Deposition of High Quality C Films for Patterning
Applied Materials Inc.
0 cites
US115877662023
Symmetric VHF Source for a Plasma Reactor
Applied Materials, Inc.
0 cites