Patents/Inventors

Karthik S. Colinjivadi

Dublin, CAUS1 patent

2 Patents

US122495142025
Carbon Based Depositions Used for Critical Dimension Control During High Aspect Ratio Feature Etches and for Forming Protective Layers
Lam Research Corporation
0 cites
US116705162023
Metal-containing Passivation for High Aspect Ratio Etch
Lam Research Corporation
0 cites