Patents/Inventors

Karthik Janakiraman

San Jose, CAUS35 patents

34 Patents

US125687912026
Controlling Concentration Profiles for Deposited Films Using Machine Learning
Applied Materials, Inc.
0 cites
US125640212026
Method of Processing a Substrate
Applied Materials, Inc.
0 cites
US125506512026
Selective Etching of Silicon-containing Material Relative to Metal-doped Boron Films
Applied Materials, Inc.
0 cites
US124826462025
Processes for Depositing Sib Films
Applied Materials, Inc.
0 cites
US124697002025
Ion Implantation for Reduced Hydrogen Incorporation in Amorphous Silicon
Applied Materials, Inc.
0 cites
US124513452025
PECVD of Sibn Thin Films with Low Leakage Current
Applied Materials, Inc.
0 cites
US123659862025
Remote Capacitively Coupled Plasma Deposition of Amorphous Silicon
APPLIED MATERIALS, Inc.
0 cites
US123621812025
Methods of Forming Thermally Stable Carbon Film
Applied Materials, Inc.
0 cites
US123343582025
Integration Processes Utilizing Boron-doped Silicon Materials
Applied Materials, Inc.
0 cites
US123259102025
Deposition of Conformal and Gap-fill Amorphous Silicon Thin-films
Applied Materials, Inc.
0 cites
US122058182025
Boron Concentration Tunability in Boron-silicon Films
Applied Materials, Inc.
0 cites
US121424802024
Seam Removal in High Aspect Ratio Gap-fill
Applied Materials, Inc.
0 cites
US121319132024
Methods, Systems, and Apparatus for Processing Substrates Using One or More Amorphous Carbon Hardmask Layers
Applied Materials, Inc.
0 cites
US120778522024
Metal-doped Boron Films
Applied Materials, Inc.
0 cites
US120606372024
Actively Cooled Foreline Trap to Reduce Throttle Valve Drift
Applied Materials, Inc.
0 cites
US120625672024
Systems and Methods for Substrate Support Temperature Control
APPLIED MATERIALS, Inc.
0 cites
US120338482024
Processes for Depositing Sib Films
Applied Materials, Inc.
0 cites
US119617392024
Boron Concentration Tunability in Boron-silicon Films
Applied Materials, Inc.
0 cites
US119396742024
Methods to Reduce Material Surface Roughness
Applied Materials, Inc.
0 cites
US119396752024
Apparatus and Methods for Improving Thermal Chemical Vapor Deposition (CVD) Uniformity
Applied Materials, Inc.
0 cites
US118275142023
Amorphous Silicon-based Films Resistant to Crystallization
Applied Materials, Inc.
0 cites
US118307062023
Heated Pedestal Design for Improved Heat Transfer and Temperature Uniformity
Applied Materials, Inc.
0 cites
US118173202023
CVD Based Oxide-metal Multi Structure for 3D NAND Memory Devices
Applied Materials, Inc.
0 cites
US117988202023
Gas Delivery Systems and Methods
Applied Materials, Inc.
0 cites
US117911362023
Deposition Radial and Edge Profile Tunability Through Independent Control of TEOS Flow
Applied Materials, Inc.
0 cites
US116995772023
Treatment for High-temperature Cleans
Applied Materials, Inc.
0 cites
US116995852023
Methods of Forming Hardmasks
APPLIED MATERIALS, Inc.
0 cites
US116949022023
Methods, Systems, and Apparatus for Processing Substrates Using One or More Amorphous Carbon Hardmask Layers
Applied Materials, Inc.
0 cites
US116768132023
Doping Semiconductor Films
Applied Materials, Inc.
0 cites
US116642142023
Methods for Producing High-density, Nitrogen-doped Carbon Films for Hardmasks and Other Patterning Applications
APPLIED MATERIALS, Inc.
0 cites
US116642262023
Methods for Producing High-density Carbon Films for Hardmasks and Other Patterning Applications
APPLIED MATERIALS, Inc.
0 cites
US116409052023
Plasma Enhanced Deposition of Silicon-containing Films at Low Temperature
Applied Materials, Inc.
0 cites
US116189492023
Methods to Reduce Material Surface Roughness
Applied Materials, Inc.
0 cites
US115629022023
Hydrogen Management in Plasma Deposited Films
Applied Materials, Inc.
0 cites