Kandabara N. Tapily

5 Patents

• US125884342026

  Methods for Forming Dielectric Materials with Selected Polarization for Semiconductor Devices

  Tokyo Electron Limited

  0 cites
• US124943622025

  Atomic Layer Deposition of Aluminum Oxide Films for Semiconductor Devices Using an Aluminum Alkoxide Oxidizer

  Tokyo Electron Limited

  0 cites
• US122848202025

  Dual Metal Wrap-around Contacts for Semiconductor Devices

  Tokyo Electron Limited

  0 cites
• US118043762023

  Method for Mitigating Lateral Film Growth in Area Selective Deposition

  Tokyo Electron Limited

  0 cites
• US116580662023

  Method for Reducing Lateral Film Formation in Area Selective Deposition

  Tokyo Electron Limited

  0 cites