33 Patents
- US126069122026High Heat Loss Heater and Electrostatic Chuck for Semiconductor Processing
Applied Materials, Inc.
0 cites - 0 cites
- US125884692026Bipolar Electrostatic Chuck Electrode with Self-induced DC Voltage
Applied Materials, Inc.
0 cites - 0 cites
- US125818962026External Substrate System Rotation in a Semiconductor Processing System
Applied Materials, Inc.
0 cites - 0 cites
- US124760922025AFE (active Far Edge) Heater/bipolar ESC with Simplified and Optimized Structure for Greater Reliability, Lower Cost and Better Manufacturability
Applied Materials, Inc.
0 cites - 0 cites
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- US122179372025Radio Frequency Source for Inductively Coupled and Capacitively Coupled Plasmas in Substrate Processing Chambers
Applied Materials, Inc.
0 cites - US122058452025Semiconductor Processing Chamber to Accommodate Parasitic Plasma Formation
Applied Materials, Inc.
0 cites - 0 cites
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- US120805842024Real Time Bias Detection and Correction for Electrostatic Chuck
Applied Materials, Inc.
0 cites - 0 cites
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- US119526602024Semiconductor Processing Chambers and Methods for Cleaning the Same
Applied Materials, Inc.
0 cites - US119526632024Hardware to Prevent Bottom Purge Incursion in Application Volume and Process Gas Diffusion Below Heater
Applied Materials, Inc.
0 cites - 0 cites
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- US118279802023Isolator Apparatus and Methods for Substrate Processing Chambers
Applied Materials, Inc.
0 cites - US118307062023Heated Pedestal Design for Improved Heat Transfer and Temperature Uniformity
Applied Materials, Inc.
0 cites - 0 cites
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- US116437252023Hardware to Prevent Bottom Purge Incursion in Application Volume and Process Gas Diffusion Below Heater
Applied Materials, Inc.
0 cites - 0 cites
- US115944402023Real Time Bias Detection and Correction for Electrostatic Chuck
Applied Materials, Inc.
0 cites - 0 cites
- US115748252023External Substrate System Rotation in a Semiconductor Processing System
Applied Materials, Inc.
0 cites