11 Patents
- US122439242025Gate Structure with Non-linear Profile for Transistors
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - 0 cites
- US121426092024Dummy Fin Between First and Second Semiconductor Fins
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US121257512024Method and Structure for Finfet Isolation
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US121131222024Dummy Fin Profile Control to Enlarge Gate Process Window
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US117642222023Method of Forming a Dummy Fin Between First and Second Semiconductor Fins
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US117217462023Method and Structure for Finfet Comprising Patterned Oxide and Dielectric Layer Under Spacer Features
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US116707112023Metal Gate Electrode of a Semiconductor Device
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US116055642023Method and Structure for Finfet Isolation
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US116057192023Gate Structure with Desired Profile for Semiconductor Devices
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US116007172023Dummy FIN Profile Control to Enlarge Gate Process Window
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd
0 cites