4 Patents
- US124475822025Chemical Mechanical Polishing Pad with Fluorinated Polymer and Multimodal Groove Pattern
Rohm And Haas Electronic Materials CMP Holdings, Inc.
0 cites - US118970822024Heterogeneous Fluoropolymer Mixture Polishing Pad
Rohm And Haas Electronic Materials CMP Holdings, Inc.
0 cites - US116389782023Low-debris Fluopolymer Composite CMP Polishing Pad
Rohm And Haas Electronic Materials CMP Holdings, Inc.
0 cites - US115481142023Compressible Non-reticulated Polyurea Polishing Pad
Rohm And Haas Electronic Materials CMP Holdings, Inc.
0 cites