Patents/Inventors

Joseph C. Olson

Beverly, MAUS20 patents

21 Patents

US126092792026
In-situ Ion Beam Angle Measurement
Applied Materials, Inc.
0 cites
US125735792026
Hybrid Apparatus, System and Techniques for Mass Analyzed Ion Beam
Applied Materials, Inc.
0 cites
US124178922025
Shadow Mask Apparatus and Methods for Variable Etch Depths
Applied Materials, Inc.
0 cites
US121069362024
Scanned Angled Etching Apparatus and Techniques Providing Separate Co-linear Radicals and Ions
Applied Materials, Inc.
0 cites
US121069252024
Cyclotron Having Continuously Variable Energy Output
Applied Materials, Inc.
0 cites
US121069352024
Modulation of Rolling K Vectors of Angled Gratings
Applied Materials, Inc.
0 cites
US120992412024
Forming Variable Depth Structures with Laser Ablation
APPLIED MATERIALS, Inc.
0 cites
US120026492024
Spinning Disk with Electrostatic Clamped Platens for Ion Implantation
Applied Materials, Inc.
0 cites
US119962662024
Apparatus and Techniques for Substrate Processing Using Independent Ion Source and Radical Source
Applied Materials, Inc.
0 cites
US119674892024
Apparatus and Techniques for Angled Etching Using Multielectrode Extraction Source
Applied Materials, Inc.
0 cites
US119487812024
Apparatus and System Including High Angle Extraction Optics
Applied Materials, Inc.
0 cites
US118624332024
System and Methods Using an Inline Surface Engineering Source
Varlan Semiconductor Equipment Associates, Inc.
0 cites
US118528532023
Etch Improvement
Applied Materials, Inc.
0 cites
US118107552023
Ion Beam Source for Optical Device Fabrication Using a Segmented Ion Source Having One or More Angled Surfaces
Applied Materials, Inc.
0 cites
US117667442023
Method of Forming a Plurality of Gratings
Applied Materials, Inc.
0 cites
US117156212023
Scanned Angled Etching Apparatus and Techniques Providing Separate Co-linear Radicals and Ions
APPLIED Materials, Inc.
0 cites
US116704822023
Modulation of Rolling K Vectors of Angled Gratings
Applied Materials, Inc.
0 cites
US116408982023
Methods of Optical Device Fabrication Using an Ion Beam Source
Applied Materials, Inc.
0 cites
US115877782023
Electrodynamic Mass Analysis with RF Biased Ion Source
Applied Materials, Inc.
0 cites
US115544452023
Methods for Controlling Etch Depth by Localized Heating
APPLIED MATERIALS, Inc.
0 cites
US115579872023
Handling and Processing Double-sided Devices on Fragile Substrates
APPLIED MATERIALS, Inc.
0 cites