Patents/Inventors

Jongkyoung Park

Hwaseong-siKR1 patent

2 Patents

US124055322025
Polymer and Composition for Forming an Anti-reflective Film and Method of Manufacturing an Integrated Circuit Device Using the Anti-reflective Film
SAMSUNG ELECTRONICS CO., Ltd.
0 cites
US116505022023
Polymer and Composition for Forming an Anti-reflective Film and Method of Manufacturing an Integrated Circuit Device Using the Anti-reflective Film
DONGJIN SEMICHEM CO., Ltd.
0 cites