3 Patents
- US122665352025Mask Encapsulation to Prevent Degradation During Fabrication of High Aspect Ratio Features
LAM RESEARH CORPORATION
0 cites - US122495142025Carbon Based Depositions Used for Critical Dimension Control During High Aspect Ratio Feature Etches and for Forming Protective Layers
Lam Research Corporation
0 cites - US118697702024Selective Deposition of Etch-stop Layer for Enhanced Patterning
Lam Research Corporation
0 cites