John Magana

2 Patents

• US116044062023

  Method and Apparatus for Fabrication of Very Large Scale Integration Pattern Features via Electroless Deposition on Extreme Ultraviolet Lithography Photomasks

  Intel Corporation

  0 cites
• US115614662023

  Monolithically Framed Pellicle Membrane Suitable for Lithography in the Fabrication of Integrated Circuits

  Intel Corporation

  0 cites