Patents/Inventors

John Hautala

Beverly, MAUS17 patents

16 Patents

US125506372026
Concurrent or Cyclical Etch and Directional Deposition
Applied Materials, Inc.
0 cites
US125291352026
Methods of Modifying Openings in Hardmasks and Photoresists to Achieve Desired Critical Dimensions
Applied Materials, Inc.
0 cites
US124179232025
Techniques and Apparatus for Selective Shaping of Mask Features Using Angled Beams
Applied Materials, Inc.
0 cites
US123692992025
Devices and Methods for DRAM Leakage Reduction
Applied Materials, Inc.
0 cites
US122550672025
Method for Depositing Layers Directly Adjacent Uncovered Vias or Contact Holes
Applied Materials, Inc.
0 cites
US121911562025
Ribbon Beam Plasma Enhanced Chemical Vapor Deposition System for Anisotropic Deposition of Thin Films
Applied Materials, Inc.
0 cites
US121836272024
Multi Process Air Gap Formation
Applied Materials, Inc.
0 cites
US121319482024
Techniques for Void-free Material Depositions
Applied Materials, Inc.
0 cites
US120966222024
Directional Etch for Improved Dual Deck Three-dimensional NAND Architecture Margin
Applied Materials, Inc.
0 cites
US119878792024
High Aspect Ratio Taper Improvement Using Directional Deposition
Applied Materials, Inc.
0 cites
US119423612024
Semiconductor Device Cavity Formation Using Directional Deposition
Applied Materials, Inc.
0 cites
US119086912024
Techniques to Engineer Nanoscale Patterned Features Using Ions
Applied Materials, Inc.
0 cites
US117788322023
Wordline Contact Formation in NAND Devices
Applied Materials, Inc.
0 cites
US117495642023
Techniques for Void-free Material Depositions
Applied Materials, Inc.
0 cites
US115748002023
Extreme Edge Uniformity Control
Varian Semiconductor Equipment Associates, Inc.
0 cites
US115690952023
Techniques and Apparatus for Selective Shaping of Mask Features Using Angled Beams
APPLIED Materials, Inc.
0 cites