Johannes Onvlee

4 Patents

• US124427592025

  Contaminant Analyzing Metrology System, Lithographic Apparatus, and Methods Thereof

  ASML Netherlands B.V.

  0 cites
• US120323012024

  Substrate Support, Lithographic Apparatus and Loading Method

  ASML NETHERLANDS B.V.

  0 cites
• US119948482024

  Systems and Methods for Adjusting Prediction Models Between Facility Locations

  ASML NETHERLANDS B.V.

  0 cites
• US115560632023

  Substrate Support, Lithographic Apparatus and Loading Method

  ASML Netherlands B.V.

  0 cites