Johannes Jacobus Matheus Baselmans

4 Patents

• US125851982026

  Lithographic Apparatus, Multi-wavelength Phase-modulated Scanning Metrology System and Method

  ASML HOLDING N.V.

  0 cites
• US120075902024

  Two-dimensional Diffraction Grating

  ASML Netherlands B.V.

  0 cites
• US118927762024

  Imaging via Zeroth Order Suppression

  ASML NETHERLANDS B.V.

  0 cites
• US115614782023

  Determining Subset of Components of an Optical Characteristic of Patterning Apparatus

  ASML Netherlands B.V.

  0 cites