Patents/Inventors

Johannes Henricus Wilhelmus Jacobs

HeezeNL4 patents

5 Patents

US124114242025
Temperature Conditioning System, a Lithographic Apparatus and a Method of Temperature Conditioning an Object
ASML NETHERLANDS B.V.
0 cites
US123325702025
Lithographic System Provided with a Deflection Apparatus for Changing a Trajectory of Particulate Debris
ASML Netherlands B.V.
0 cites
US122042552025
Lithographic Apparatus and Method
ASML NETHERLANDS B.V.
0 cites
US118468872023
Prolonging Optical Element Lifetime in an EUV Lithography System
ASML Netherlands B.V.
0 cites
US116303992023
Lithographic Apparatus and Method
ASML NETHERLANDS B.V.
0 cites