Jin Woo Cho

7 Patents

• US123796542025

  Pellicle for Extreme Ultraviolet Lithography

  Korea Electronics Technology Institute

  0 cites
• US123266582025

  Pellicle for Extreme Ultraviolet Lithography Containing Molybdenum Carbide

  KOREA ELECTRONICS TECHNOLOGY INSTITUTE

  0 cites
• US123210922025

  Pellicle for Extreme Ultraviolet Lithography Containing Amorphous Carbon and Method for Manufacturing the Same

  Korea Electronics Technology Institute

  0 cites
• US122875682025

  Low-temperature Direct Growth Method of Multilayer Graphene, Pellicle for Extreme Ultraviolet Lithography Using the Same, and Method for Manufacturing the Pellicle

  Korea Electronics Technology Institute

  0 cites
• US122822502025

  Pellicle for Extreme Ultraviolet Lithography Based on Yttrium

  KOREA ELECTRONICS TECHNOLOGY INSTITUTE

  0 cites
• US119278812024

  Pellicle for Extreme Ultraviolet Lithography Based on Yttrium Carbide

  Korea Electronics Technology Institute

  0 cites
• US117893592023

  Method for Manufacturing Pellicle for Extreme Ultraviolet Lithography Having Graphene Defect Healing Layer

  KOREA ELECTRONICS TECHNOLOGY INSTITUTE

  0 cites