52 Patents
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- US124647642025Low Parasitic Capacitance Contact Structure
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US124329942025Source/drain Metal Contact and Formation Thereof
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd
0 cites - US124262982025Semiconductor Device with Metal Cap on Gate
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US124190942025Semiconductor Device with Trimmed Channel Region and Method of Making the Same
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - 0 cites
- US123961912025Isolation Structures of Semiconductor Devices
Taiwan Semiconductor Manufacturing Co., Ltd.
0 cites - 0 cites
- US123827092025Semiconductor Device Structure and Method for Forming the Same
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US123226532025Self-aligned Metal Gate for Multigate Device and Method of Forming Thereof
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US123242152025Semiconductor Device Structure with Metal Gate Stack
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US123175282025Gate Isolation Feature and Manufacturing Method Thereof
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US123005362025Glue Layer Etching for Improving Device Performance and Providing Contact Isolation
Taiwan Semiconductor Manufacturing Co., Ltd.
0 cites - US122665662025Contact Resistance Between via and Conductive Line
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US122439182025Semiconductor Device with Dielectric Liners on Gate Refill Metal
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US121837332024Semiconductor Device Structure and Methods of Forming the Same
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US121837992024Semiconductor Device with Gate Isolation Features and Fabrication Method of the Same
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US121702032024Integrated Circuit with Conductive via Formation on Self-aligned Gate Metal Cut
Taiwan Semiconductor Manufacturing Co., Ltd.
0 cites - 0 cites
- US121599122024Integrated Circuit Including Spacer Structure for Transistors
Taiwan Semiconductor Manufacturing Co., Ltd.
0 cites - US121599222024Method of Fabricating Semiconductor Device
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US121259122024Semiconductor Device Structure and Method for Forming the Same Preliminary Class
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US121070062024Method for Manufacturing Semiconductor Structure with Dielectric Feature
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US121071462024Self-aligned Air Spacers and Methods for Forming
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US120878602024Methods of Forming Contact Features in Field-effect Transistors
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US120573442024Semiconductor Device and Method of Fabricating the Same
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US120573982024Semiconductor Device with Multi-layer Dielectric and Methods of Forming the Same
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US120517382024Isolation Structures of Semiconductor Devices
Taiwan Semiconductor Manufacturing Co., Ltd.
0 cites - US120402732024Semiconductor Device with Multi-layer Dielectric
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US120211362024Gate Isolation Feature and Manufacturing Method Thereof
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US120211482024Semiconductor Device with Metal Cap on Gate
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US120092542024Contact Resistance Between via and Conductive Line
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - 0 cites
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- US120027562024Butted Contacts and Methods of Fabricating the Same in Semiconductor Devices
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US119617632024Self-aligned Metal Gate for Multigate Device and Method of Forming Thereof
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US119294132024Semiconductor Device Structure with Metal Gate Stack
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - 0 cites
- 0 cites
- 0 cites
- US118761192024Semiconductor Device with Gate Isolation Features and Fabrication Method of the Same
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US118551442023Source/drain Metal Contact and Formation Thereof
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US117990192023Gate Isolation Feature and Manufacturing Method Thereof
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US117696902023Semiconductor Device and Method of Fabricating the Same
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US117569582023Semiconductor Device Structure and Methods of Forming the Same
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US117355912023Semiconductor Devices with Dielectric Fins and Method for Forming the Same
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - 0 cites
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- US116371862023Field Effect Transistor Having Gate Contact and Source/drain Contact Separated by a Gap
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US116317492023Method of Fabricating Semiconductor Device
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US116213522023Semiconductor Device and Method of Manufacturing the Same
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - 0 cites