5 Patents
- US125384992026Semiconductor Device Including Dielectric Layer and Method of Forming the Same
SAMSUNG ELECTRONICS CO., Ltd.
0 cites - US125016312025Capacitor, and Device Comprising the Same, and Method of Preparing the Same
Samsung Electronics Co., Ltd.
0 cites - US117497132023Capacitor Including Perovskite Material, Semiconductor Device Including the Capacitor, and Method of Manufacturing the Capacitor
Samsung Electronics Co., Ltd.
0 cites - US117497142023Capacitor Including Perovskite Material, Semiconductor Device Including the Capacitor, and Method of Manufacturing the Capacitor
Samsung Electronics Co., Ltd.
0 cites - US116580242023Semiconductor Device and Method of Manufacturing the Same
Samsung Electronics Co.. Ltd.
0 cites