Patents/Inventors

Jeonghoon Oh

Saratoga, CAUS24 patents

25 Patents

US126057662026
Methods for Upper Platen Manufacturing
Applied Materials, Inc.
0 cites
US126058022026
Condensed Gas Pad Conditioner
Applied Materials, Inc.
0 cites
US124590782025
In-situ Conditioner Disk Cleaning During CMP
Applied Materials, Inc.
0 cites
US124540362025
Substrate Handling Systems and Methods for CMP Processing
Applied Materials, Inc.
0 cites
US124475792025
Chemical Mechanical Polishing Vibration Measurement Using Optical Sensor
Applied Materials, Inc.
0 cites
US124343482025
Retaining Ring Having Inner Surfaces with Features
Applied Materials, Inc.
0 cites
US124035612025
Eddy Current Monitoring to Detect Vibration in Polishing
Applied Materials, Inc.
0 cites
US123374392025
Multiple Disk Pad Conditioner
Applied Materials, Inc.
0 cites
US120489812024
Retaining Ring Having Inner Surfaces with Features
Applied Materials, Inc.
0 cites
US120366352024
Methods of Detecting Non-conforming Substrate Processing Events During Chemical Mechanical Polishing
Applied Materials, Inc.
0 cites
US120338652024
Retaining Ring Having Inner Surfaces with Facets
Applied Materials, Inc.
0 cites
US119118692024
Chemical Mechanical Polishing System with Platen Temperature Control
Applied Materials, Inc.
0 cites
US118907172024
Polishing System with Platen for Substrate Edge Control
Applied Materials, Inc.
0 cites
US118507002023
Sequential Application of Cleaning Fluids for Improved Maintenance of Chemical Mechanical Polishing Systems
Applied Materials, Inc.
0 cites
US118507032023
Method of Forming Retaining Ring with Shaped Surface
Applied Materials, Inc.
0 cites
US117800462023
Polishing System with Annular Platen or Polishing Pad
Applied Materials, Inc.
0 cites
US117689842023
Parameter Sensing and Computer Modeling for Gas Delivery Health Monitoring
Applied Materials, Inc.
0 cites
US117640692023
Asymmetry Correction via Variable Relative Velocity of a Wafer
Applied Materials, Inc.
0 cites
US117179362023
Methods for a Web-based CMP System
Applied Materials, Inc.
0 cites
US117017492023
Monitoring of Vibrations During Chemical Mechanical Polishing
Applied Materials, Inc.
0 cites
US116825612023
Retaining Ring Having Inner Surfaces with Facets
Applied Materials, Inc.
0 cites
US116732262023
Retaining Ring for CMP
Applied Materials, Inc.
0 cites
US116211522023
Methods and Apparatus for Processing a Substrate Using Improved Shield Configurations
APPLIED MATERIALS, Inc.
0 cites
US115970522023
Temperature Control of Chemical Mechanical Polishing
Applied Materials, Inc.
0 cites
US115773612023
Retaining Ring with Shaped Surface and Method of Forming
Applied Materials, Inc.
0 cites