Jeffrey W. Anthis

11 Patents

• US125936292026

  Selective Deposition Processes on Semiconductor Substrates

  Applied Materials, Inc.

  0 cites
• US125711002026

  Atomic Layer Deposition of Molybdenum Silicide Thin Films

  Wayne State University

  0 cites
• US125753922026

  Method to Deposit Metal Cap for Interconnect

  APPLIED MATERIALS, Inc.

  0 cites
• US124697152025

  Dry Etching with Etch Byproduct Self-cleaning

  Applied Materials, Inc.

  0 cites
• US122610492025

  Selective Etch of a Substrate

  Applied Materials , Inc.

  0 cites
• US120183632024

  Gap-fill with Aluminum-containing Films

  Applied Materials, Inc.

  0 cites
• US119461352024

  Low Temperature Deposition of Iridium Containing Films

  Applied Materials, Inc.

  0 cites
• US118942332024

  Electronic Device Having an Oxygen Free Platinum Group Metal Film

  Applied Materials, Inc.

  0 cites
• US118210702023

  Ruthenium Film Deposition Using Low Valent Metal Precursors

  APPLIED MATERIALS, Inc.

  0 cites
• US116437212023

  Low Temperature Deposition of Iridium Containing Films

  Applied Materials, Inc.

  0 cites
• US115520822023

  Reducing Gate Induced Drain Leakage in DRAM Wordline

  Applied Materials, Inc.

  0 cites