7 Patents
- US123728672025Photoresists Comprising Multiple Acid Generator Compounds
DUPONT ELECTRONIC MATERIALS INTERNATIONAL, LLC
0 cites - US122769102025Photoresist Compositions and Pattern Formation Methods
DUPONT ELECTRONIC MATERIALS INTERNATIONAL, LLC
0 cites - US119472582024Photoacid-generating Monomer, Polymer Derived Therefrom, Photoresist Composition Including the Polymer, and Method of Forming a Photoresist Relief Image Using the Photoresist Composition
ROHM AND HASS ELECTRONIC MATERIALS LLC
0 cites - US119327132024Monomers, Polymers and Lithographic Compositions Comprising Same
ROHM AND HAAS ELECTRONIC MATERIALS LLC
0 cites - 0 cites
- US118529722023Photoresist Compositions and Pattern Formation Methods
ROHM AND HAAS ELECTRONIC MATERIALS LLC
0 cites - US116135192023Photoacid-generating Monomer, Polymer Derived Therefrom, Photoresist Composition Including the Polymer, and Method of Forming a Photoresist Relief Image Using the Photoresist Composition
ROHM AND HAAS ELECTRONIC MATERIALS LLC
0 cites