11 Patents
- US125617882026Fluorescence Microscopy Metrology System and Method of Operating Fluorescence Microscopy Metrology System
IUCF-HYU (Industry-university Cooperation Foundation Hanyang University)
0 cites - 0 cites
- US123133932025Level Sensor and Substrate Processing Apparatus Including the Same
SAMSUNG ELECTRONICS CO., Ltd.
0 cites - US122284992025Pupil Ellipsometry Measurement Apparatus and Method and Method of Fabricating Semiconductor Device Using the Pupil Ellipsometry Measurement Method
SAMSUNG ELECTRONICS CO., Ltd.
0 cites - 0 cites
- US121246982024Computer System for Hybrid of Epoch- and Pointer-based Memory Reclamation, and Method Thereof
Korea Advanced Institute Of Science And Technology
0 cites - US120026982024Metrology Apparatus and Method Based on Diffraction Using Oblique Illumination and Method of Manufacturing Semiconductor Device Using the Metrology Method
SAMSUNG ELECTRONICS CO., Ltd.
0 cites - US119729602024Imaging Ellipsometry (ie)-based Inspection Method and Method of Fabricating Semiconductor Device by Using Ie-based Inspection Method
SAMSUNG ELECTRONICS CO., Ltd.
0 cites - US117260462023Multi-scale Spectral Imaging Apparatuses and Methods, and Methods of Manufacturing Semiconductor Devices by Using the Imaging Methods
Samsung Electronics Co., Ltd.
0 cites - US116246992023Measurement System Capable of Adjusting AOI, AOI Spread and Azimuth of Incident Light
SAMSUNG ELECTRONICS CO., Ltd.
0 cites - US116041362023Pupil Ellipsometry Measurement Apparatus and Method and Method of Fabricating Semiconductor Device Using the Pupil Ellipsometry Measurement Method
SAMSUNG ELECTRONICS CO., Ltd.
0 cites