21 Patents
- US126160112026Semiconductor Device Including a Self-aligned Contact Layer with Enhanced Etch Resistance
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US125882342026Semiconductor Devices with Implanted STI Regions and Methods of Forming the Same
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US125573682026High-k Dielectric Materials with Dipole Layer
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US124955662025Semiconductor Device Having Strained Channel and Method for Manufacturing the Same
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
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- US124068592025Gate Structures in Semiconductor Devices
Taiwan Semiconductor Manufacturing Company, Ltd.
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- US123693842025Semiconductor Device Structure Including Dielectric Region with Plurality of Different Oxidation Regions
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US122665432025Semiconductor Device Structure Having Gate Dielectric Layer
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US120574952024Semiconductor Device with Conformal Source/drain Layer
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - 0 cites
- US119786742024Semiconductor Device Structure and Methods of Forming the Same
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
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- US117354832023Method for Forming Epitaxial Source/drain Features Using a Self-aligned Mask and Semiconductor Devices Fabricated Thereof
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US117284142023Semiconductor Device Including a Fin-fet and Method of Manufacturing the Same
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US117107792023Semiconductor Device Including Interface Layer and Method of Fabricating Thereof
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US117055072023Semiconductor Device and Forming Method Thereof
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
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