17 Patents
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- US126105842026Selective Growth of High-k Oxide on Channel of Gate-all-around Transistors
Intel Corporation
0 cites - US125686442026Contact Over Active Gate Structures with Trench Contact Layers for Advanced Integrated Circuit Structure Fabrication
Intel Corporation
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- US124379292025Capacitor with an Electrically Conductive Layer Coupled with a Metal Layer of the Capacitor
Intel Corporation
0 cites - US123289272025Low Resistance and Reduced Reactivity Approaches for Fabricating Contacts and the Resulting Structures
Intel Coporation
0 cites - US122552252025Low Leakage Thin Film Capacitors Using Titanium Oxide Dielectric with Conducting Noble Metal Oxide Electrodes
Intel Corporation
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- US121837392024Ribbon or Wire Transistor Stack with Selective Dipole Threshold Voltage Shifter
Intel Corporation
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- US121007312024Crystalline Bottom Electrode for Perovskite Capacitors and Methods of Fabrication
Intel Corporation
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- US119800372024Memory Cells with Ferroelectric Capacitors Separate from Transistor Gate Stacks
Intel Corporation
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- US117424072023Multilayer High-k Gate Dielectric for a High Performance Logic Transistor
Intel Corporation
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