Patents/Inventors

Hyeoncheol Park

Hwaseong-siKR4 patents

2 Patents

US122697532025
Ternary Paraelectric Material with Space Group Cc and Method of Manufacturing the Same
Samsung Electronics Co., Ltd.
0 cites
US118588292024
Ternary Paraelectric Material with Space Group Cc and Method of Manufacturing the Same
Samsung Electronics Co., Ltd.
0 cites