Patents/Inventors

Hwanseok Seo

Suwon-siKR1 patent

2 Patents

US120992932024
Phase Shift Mask for Extreme Ultraviolet Lithography and a Method of Manufacturing a Semiconductor Device Using the Same
Samsung Electronics Co., Ltd.
0 cites
US117748462023
Phase Shift Masks for Extreme Ultraviolet Lithography
Samsung Electronics Co., Ltd.
0 cites