Patents/Inventors

Hungbae Ahn

Hwaseong-siKR1 patent

2 Patents

US122601642025
Method for Designing Pattern Layout Including Oblique Edges and Method for Manufacturing Semiconductor Device Using the Same
SAMSUNG ELECTRONICS CO., Ltd.
0 cites
US117405532023
Method of Manufacturing Photomask Set for Forming Patterns
SAMSUNG ELECTRONICS CO., Ltd.
0 cites