Patents/Inventors

Hung-yang Chen

Somerset, NJUS1 patent

2 Patents

US123604532025
Pag-free Positive Chemically Amplified Resist Composition and Methods of Using the Same
Merck Patent GmbH
0 cites
US122769092025
Novolak/dnq Based, Chemically Amplified Photoresist
Merck Patent GmbH
0 cites