Hung-chih Hsieh

6 Patents

• US125542062026

  Overlay Marks for Reducing Effect of Bottom Layer Asymmetry

  TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.

  0 cites
• US122164122025

  Frequency-picked Methodology for Diffraction-based Overlay Measurement

  TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.

  0 cites
• US118529812023

  Frequency-picked Methodology for Diffraction Based Overlay Measurement

  TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.

  0 cites
• US118416222023

  Method and Apparatus for Diffraction-based Overlay Measurement

  TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.

  0 cites
• US117264132023

  Overlay Marks for Reducing Effect of Bottom Layer Asymmetry

  TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.

  0 cites
• US116563912023

  Aperture Design and Methods Thereof

  TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.

  0 cites