11 Patents
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- US125776662026Precursor Dispensing Systems with Line Charge Volume Containers for Atomic Layer Deposition
Lam Research Corporation
0 cites - US123314022025Integrated Showerhead with Thermal Control for Delivering Radical and Precursor Gas to a Downstream Chamber to Enable Remote Plasma Film Deposition
Lam Research Corporation
0 cites - US122278372025Ex Situ Coating of Chamber Components for Semiconductor Processing
Lam Research Corporation
0 cites - 0 cites
- US121632192024Ex Situ Coating of Chamber Components for Semiconductor Processing
Lam Research Corporation
0 cites - US120000472024Integrated Showerhead with Thermal Control for Delivering Radical and Precursor Gas to a Downstream Chamber to Enable Remote Plasma Film Deposition
Lam Research Corporation
0 cites - US119202392024Minimizing Radical Recombination Using ALD Silicon Oxide Surface Coating with Intermittent Restoration Plasma
Lam Research Corporation
0 cites - US117027482023Wafer Level Uniformity Control in Remote Plasma Film Deposition
Lam Research Corporation
0 cites - US116085592023Integrated Showerhead with Thermal Control for Delivering Radical and Precursor Gas to a Downstream Chamber to Enable Remote Plasma Film Deposition
Lam Research Corporation
0 cites - US115574602023Radio Frequency (RF) Signal Source Supplying RF Plasma Generator and Remote Plasma Generator
Lam Research Corporation
0 cites