8 Patents
- US122975592025Method and Apparatus for Low Temperature Selective Epitaxy in a Deep Trench
APPLIED MATERIALS, Inc.
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- US117911662023Selective Etch Process Using Hydrofluoric Acid and Ozone Gases
MATTSON TECHNOLOGY, Inc.
0 cites - 0 cites
- US116495592023Method of Utilizing a Degassing Chamber to Reduce Arsenic Outgassing Following Deposition of Arsenic-containing Material on a Substrate
Applied Materials, Inc.
0 cites - 0 cites
- US116262692023Chamber Seasoning to Improve Etch Uniformity by Reducing Chemistry
MATTSON TECHNOLOGY, Inc.
0 cites