Patents/Inventors

Hsin-chang Lee

Hsinchu CountyTW73 patents

78 Patents

US126191422026
Methods of Manufacturing Pellicle for EUV Lithography Masks
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites
US126079232026
Mask and Method for Forming the Same
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites
US125786522026
Photomask and Methods for Measuring and Manufacturing the Photomask
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites
US125782702026
Mask Characterization Methods
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites
US125786402026
Photosensitive Material for Photoresist and Lithography
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites
US125541912026
Pellicle Membrane and Method of Forming the Same
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites
US125576092026
Methods for Dry Printing Carbon Nanotube Membranes
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites
US125357402026
Interstitial Type Absorber for Extreme Ultraviolet Mask
Taiwan Semiconductor Manufacturing Co., Ltd.
0 cites
US124932372025
EUV Pellicle and Mounting Method Thereof on Photo Mask
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites
US124875192025
Reticle Container
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites
US124614472025
Optical Assembly with Coating and Methods of Use
Taiwan Semiconductor Manufacturing Co., Ltd.
0 cites
US124614402025
Pellicle Membrane with Improved Properties
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites
US124168532025
EUV Photo Masks and Manufacturing Method Thereof
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites
US124008642025
Methods and Systems for Improving Plasma Ignition Stability
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites
US123931292025
Method and Device for Cleaning Substrates
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites
US123931242025
High Throughput and High Position Accurate Method for Particle Inspection of Mask Pods
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites
US123667982025
Lithography Mask and Methods
Taiwan Semiconductor Manufacturing Co., Ltd.
0 cites
US123667972025
EUV Photo Masks and Manufacturing Method Thereof
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites
US123531202025
EUV Photo Masks and Manufacturing Method Thereof
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites
US123460202025
Optical Assembly with Coating and Methods of Use
Taiwan Semiconductor Manufacturing Co., Ltd.
0 cites
US123460212025
Simultaneous Carbon Nanotube Growth, Catalyst Removal, Boron Nitride Nanotube Shell Formation Method for EUV Pellicles
Taiwan Semiconductor Manufacturing Co., Ltd.
0 cites
US123460232025
Optical Assembly with Coating and Methods of Use
Taiwan Semiconductor Manufacturing Co., Ltd.
0 cites
US123460272025
Methods of Making a Semiconductor Device
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites
US123460192025
Reflective Mask
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites
US123395822025
Photomask Including Fiducial Mark and Method of Making a Photomask
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites
US123395792025
Method of Critical Dimension Control by Oxygen and Nitrogen Plasma Treatment in EUV Mask
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites
US122986732025
Method of Manufacturing Photo Masks
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites
US122653222025
EUV Mask Blank and Method of Making EUV Mask Blank
Taiwan Semiconductor Manufacturing Co., Ltd.
0 cites
US122596492025
Cleaning Method for Photo Masks and Apparatus Therefor
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites
US121817972024
Extreme Ultraviolet Mask with Alloy Based Absorbers
Taiwan Semiconductor Manufacturing Co., Ltd.
0 cites
US121693572024
Method of Fabricating and Servicing a Photomask
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites
US121533392024
Network Type Pellicle Membrane and Method for Forming the Same
Taiwan Semiconductor Manufacturing Co., Ltd.
0 cites
US121533372024
Extreme Ultraviolet Mask with Tantalum Base Alloy Absorber
Taiwan Semiconductor Manufacturing Co., Ltd.
0 cites
US121471542024
EUV Photo Masks and Manufacturing Method Thereof
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites
US121408572024
Method of Fast Surface Particle and Scratch Detection for EUV Mask Backside
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites
US121354992024
Reticle Enclosure for Lithography Systems
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites
US121305482024
Extreme Ultraviolet Mask with Reduced Wafer Neighboring Effect
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites
US120929522024
Methods for Forming Extreme Ultraviolet Mask Comprising Magnetic Material
Taiwan Semiconductor Manufacturing Co., Ltd.
0 cites
US120858662024
Particle Removing Assembly and Method of Cleaning Mask for Lithography
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites
US120858432024
Method of Manufacturing EUV Photo Masks
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites
US120503992024
Pellicle Assembly and Method of Making Same
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites
US120449602024
EUV Photo Masks and Manufacturing Method Thereof
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites
US120449592024
EUV Photo Masks and Manufacturing Method Thereof
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites
US120386932024
Method of Manufacturing Photo Masks
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites
US120323022024
Method and Device for Cleaning Substrates
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites
US120193672024
Mask Blanks and Methods for Depositing Layers on Mask Blank
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites
US120136322024
Pellicle Having Vent Hole
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd
0 cites
US120136462024
High Throughput and High Position Accurate Method for Particle Inspection of Mask Pods
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites
US120136302024
EUV Photo Masks and Manufacturing Method Thereof
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites
US120011322024
Protection Layer on Low Thermal Expansion Material (LTEM) Substrate of Extreme Ultraviolet (EUV) Mask
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites
US119889532024
EUV Masks to Prevent Carbon Contamination
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites
US119829362024
Photomask and Method of Fabricating a Photomask
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites
US119602012024
Method of Critical Dimension Control by Oxygen and Nitrogen Plasma Treatment in EUV Mask
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites
US119142862024
Pellicle Assembly and Method for Advanced Lithography
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd
0 cites
US119068972024
Method for Extreme Ultraviolet Lithography Mask Treatment
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites
US118993572024
Lithography Mask
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites
US118680412024
Pellicle and Method of Using the Same
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites
US118605322024
Photomask Including Fiducial Mark and Method of Making a Semiconductor Device Using the Photomask
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites
US118529662023
Lithography Mask with a Black Border Regions and Method of Fabricating the Same
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites
US118529692023
Cleaning Method for Photo Masks and Apparatus Therefor
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites
US118529652023
Extreme Ultraviolet Mask with Tantalum Base Alloy Absorber
Taiwan Semiconductor Manufacturing Co., Ltd.
0 cites
US118468812023
EUV Photomask
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites
US118290622023
EUV Photo Masks and Manufacturing Method Thereof
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites
US118222302023
EUV Pellicle and Mounting Method Thereof on Photo Mask
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites
US118158052023
Mask for Extreme Ultraviolet Photolithography
Taiwan Semiconductor Manufacturing Co., Ltd.
0 cites
US118158042023
EUV Mask Blank and Method of Making EUV Mask Blank
0 cites
US117893562023
Method of Manufacturing EUV Photo Masks
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites
US117684312023
Method of Fast Surface Particle and Scratch Detection for EUV Mask Backside
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites
US117405472023
Method of Manufacturing Extreme Ultraviolet Mask with Reduced Wafer Neighboring Effect
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites
US117263992023
EUV Photo Masks and Manufacturing Method Thereof
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites
US117143502023
Method of Fabricating and Servicing a Photomask
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites
US116985922023
Particle Removing Assembly and Method of Cleaning Mask for Lithography
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites
US116870062023
Method of Manufacturing Photo Masks
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites
US116504932023
Method of Critical Dimension Control by Oxygen and Nitrogen Plasma Treatment in EUV Mask
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites
US116198752023
EUV Photo Masks and Manufacturing Method Thereof
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites
US116146912023
High Throughput and High Position Accurate Method for Particle Inspection of Mask Pods
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites
US115927372023
EUV Photo Masks and Manufacturing Method Thereof
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites
US115614642023
EUV Masks to Prevent Carbon Contamination
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites