7 Patents
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- US122610502025Method of Manufacturing Semiconductor Device, and Etching Gas
KANTO DENKA KOGYO CO., Ltd.
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- US118145612023Dry Etching Gas Composition Comprising Sulfur-containing Fluorocarbon Compound Having Unsaturated Bond and Dry Etching Method Using the Same
KANTO DENKA KOGYO CO., Ltd.
0 cites - US117953962023Dry Etching Gas Composition Comprising Sulfur-containing Fluorocarbon Compound Having Unsaturated Bond and Dry Etching Method Using the Same
KANTO DENKA KOGYO CO., Ltd.
0 cites - US117953972023Dry Etching Gas Composition Comprising Sulfur-containing Fluorocarbon Compound and Dry Etching Method Using the Same
KANTO DENKA KOGYO CO., Ltd.
0 cites