Patents/Inventors

Hiroyuki Onoda

TokyoJP2 patents

4 Patents

US124826352025
Plasma Processing Device, and Plasma Processing Method
Tokyo Electron Limited
0 cites
US124826372025
Plasma Source and Plasma Processing Apparatus
Tokyo Electron Limited
0 cites
US123126832025
Substrate Processing Method and Substrate Processing Device
Tokyo Electron Limited
0 cites
US120209002024
Plasma Processing Device, and Plasma Processing Method
Tokyo Electron Limited
0 cites