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Inventors
Hiroyoshi Tanabe
Tokyo
JP
4 patents
5 Patents
US12216398
2025
Reflective Mask Blank and Reflective Mask
AGC Inc.
0 cites
US12038685
2024
Reflective Mask Blank for EUV Lithography
AGC Inc.
0 cites
US11914283
2024
Reflective Mask Blank and Reflective Mask
AGC Inc.
0 cites
US11835852
2023
Reflective Mask Blank for EUV Exposure, and Reflective Mask
AGC Inc.
0 cites
US11698580
2023
Reflective Mask Blank for EUV Lithography
AGC Inc.
0 cites